| Identification | |
| Name: | Tetramethylammonium hydroxide |
| Synonyms: | N,N,N-TRIMETHYLMETHANAMINIUM HYDROXIDE; TMAH; hydroxydedetetramethylammonium; megapositcd14; Methanaminium,N,N,N-trimethyl-,hydroxide; n,n,n-trimethyl-methanaminiuhydroxide; nmd3; 104422-11-9; 105468-35-7; 123626-97-1; 129653-91-4; 129654-61-1; 143549-79-5; 154636-59-6; 195460-17-4; 78017-87-5; 93615-68-0 |
| CAS: | 75-59-2 |
| EINECS: | 200-882-9 |
| Molecular Formula: | C4H13NO |
| Molecular Weight: | 91.15 |
| InChI: | InChI=1/C4H12N.H2O/c1-5(2,3)4;/h1-4H3;1H2/q+1;/p-1 |
| Molecular Structure: |  |
| Properties | |
| Transport: | UN 1835 |
| Density: | 1.016 (25% aq.) |
| Stability: | Stable. Flammable. Incompatible with strong oxidizing agents, strong acids. |
| Refractive index: | 1.3806 |
| Solubility: | Miscible |
| Appearance: | colourless to yellow liquid |
| Specification: |
? Tetramethylammonium hydroxide , with CAS number of 75-59-2, can be called Hydroxyde de tetramethylammonium ; Ammonium, tetramethyl-, hydroxide . It is a?colourless to yellow liquid, Tetramethylammonium hydroxide (CAS NO.75-59-2) is used as an anisotropic etchant of silicon, it is also used as a basic solvent in the development of acidic photoresist in the photolithography process. Since it is a phase transfer catalyst, tetramethylammonium hydroxide is highly effective in stripping photoresist. It is also used as a surfactant in the synthesis of ferrofluid, to prevent agglomeration. |
| Report: |
Reported in EPA TSCA Inventory. |
| Packinggroup: | II |
| HS Code: | 29239000 |
| Sensitive: | Air Sensitive |
| Usage: | Used as a basic solvent in the development of acidic photoresist in the photolithography process. |
| Safety Data | |
| Hazard Symbols |
C:Corrosive
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